Моделирование изменения масок в процессах поперечного травления

Navickas, Romualdas

Use this url to cite publication: https://hdl.handle.net/20.500.14911/132666

Моделирование изменения масок в процессах поперечного травления

Details

Publication Type (CRIS)

Straipsnis kitame recenzuojamame leidinyje / Article in other peer-reviewed edition (S5)

Publication Type (eLABa)

Straipsnis kitame recenzuotame leidinyje / Article in other peer-reviewed publication (S4)

Author(s)

Author	Affiliation
Navickas, Romualdas	Elektroninių sistemų katedra / Department of Electronic Systems (0549)

Title

Моделирование изменения масок в процессах поперечного травления

[ru]

Р. Навицкас

Is part of

Электроника и связь : научно-технический журнал

Published In

Year	Start Page	End Page
2002	52	55

Publisher

Киев : КПI

Extent

p. 52-55

URI

URI
https://hdl.handle.net/20.500.14911/132666

Science / Art Area

Technologijos mokslai / Technological sciences (T)

Field of Science / Art

Elektros ir elektronikos inžinerija / Electrical and electronic engineering (T001)

Abstract (en)

The model of the evolution masks in the process underetching layers is created by PC with MATLAB 5.3 for analysis and design new technologies semiconductors devices, integrated circuits and biomedical and others microsystems. The results are achieving for differents iniatial data (rates of etching masks and underetching layers, geometry of the masks etc.).